Deprotection of silyl groups by Pd/C/H2: A simple and selective method

ORGN 640

Sheila Marie H. Jacobo1, Seongjin Kim1, Chih Tsung Chang1, Sophie Bellone1, William S. Powell2, and Joshua Rokach1. (1) Claude Pepper Institute and Department of Chemistry, Florida Institute of Technology, 150 W. University Blvd., Melbourne, FL 32901, (2) Meakins-Christie Laboratories and Department of Medicine, McGill University, 3626 St-Urbain St., Montreal QC, H2 X 2P2, Canada
A simple and efficient method for deprotection of silyl groups is described. The method is based on the use of Pd/C/H2 on silyl groups TES, TPS, TBS, TBDMS, TIPS and TBDPS. High selectivity was achieved, allowing the removal of TES, TPS, TBS and TBDMS in the presence of TIPS and TBDPS.